• DocumentCode
    709112
  • Title

    A tunable Marchand balun at K band in silicon germanium (SiGe) technology

  • Author

    Boglione, Luciano ; Goodman, Joel

  • Author_Institution
    Naval Res. Lab., Washington, DC, USA
  • fYear
    2015
  • fDate
    16-18 March 2015
  • Firstpage
    292
  • Lastpage
    295
  • Abstract
    This paper presents the design of a switch-based, tunable Marchand balun at K band. The tunability is achieved by using pass gate CMOS structures that ideally switch in or out sections of the balun, thereby controlling its frequency response. The balun is fabricated in a high performance SiGe BiCMOS process with standard 180 nm CMOS technology. The ability to tune the response across a frequency range is demonstrated. The balun is characterized in terms of mixed signal scattering parameters. Extensive layout and simulations have been executed. The authors believe this is the first demonstration of a tunable balun using pass gate structures to change the lengths of the balun windings in the high region of the microwave range.
  • Keywords
    BiCMOS integrated circuits; CMOS integrated circuits; Ge-Si alloys; baluns; bipolar MMIC; circuit tuning; field effect MMIC; frequency response; semiconductor materials; BiCMOS process; K band; SiGe; Silicon Germanium technology; balun windings; frequency response; mixed signal scattering parameters; pass gate CMOS structures; size 180 nm; switch-based tunable Marchand balun; Bandwidth; Impedance matching; Logic gates; Microwave circuits; Ports (Computers); Silicon germanium; Switches;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference (GeMiC), 2015 German
  • Conference_Location
    Nuremberg
  • Type

    conf

  • DOI
    10.1109/GEMIC.2015.7107811
  • Filename
    7107811