• DocumentCode
    709637
  • Title

    Copper-filled anodized aluminum oxide a potential material for low temperature bonding for 3D packaging

  • Author

    Yamashita, Kosuke ; Hotta, Yoshinori ; Kurooka, Shunji ; Abe, Hirofumi ; Tan, Shiro

  • Author_Institution
    Electron. Mater. Res. Labs., FUJIFILM Corp., Shizuoka, Japan
  • fYear
    2015
  • fDate
    14-17 April 2015
  • Firstpage
    571
  • Lastpage
    574
  • Abstract
    Copper-filled anodized aluminum oxide (Cu-filled AAO) will be presented as a potential base material for bonding between the small pads of IC chips. This paper presents a potential material for low temperature bonding for 3D packaging. The material was prepared by filling metal Cu into isolated nano-holes of anodized aluminum oxide (AAO), which were formed by the anodic oxidation treatment of aluminum. The tips of nano-Cu filaments were exposed from AAO surface (Cu nano-nail) so as to bond to Cu pads. In 3D packaging, upper and lower chips can be connected using anisotropic conductive materials. In Cu-filled AAO, the electric conductivity appears only in the vertical direction along filled metal, and insulation property by AAO appears in the horizontal direction. As a result, the anisotropic conductivity ratio (vertical vs. horizontal) is 1017. Thermal anisotropy is also demonstrated, because the filled metal conducts heat in the vertical direction. The anisotropic thermal conductivity ratio is about 34. Thermal conductivity of Cu-filled AAO is 20 times higher than that of the conventional resin, used for under-fill materials. Cu-filled AAO is promising bonding material for the thermal management in 3D integration. The low-temperature-sintering technology using the metallic Nano particle is known already well. The exposed Cu nano-nail can be sintered similar to the metallic nano-particles. We demonstrate the low temperature Cu-Cu bonding capability by using the Cu nano-nail. The direct bonding of Cu was achieved at 523K on this Cu nano-nail on Cu- filled AAO.
  • Keywords
    copper; cryogenic electronics; integrated circuit bonding; integrated circuit packaging; nanoparticles; sintering; thermal conductivity; thermal management (packaging); 3D integration; 3D packaging; AAO surface; Cu-Cu; IC chips; anisotropic conductive materials; anisotropic conductivity ratio; anisotropic thermal conductivity; anodic oxidation treatment; bonding material; copper-filled anodized aluminum oxide; direct bonding; electric conductivity; horizontal direction; insulation property; low temperature bonding; low-temperature-sintering technology; metallic nanoparticle; nanonail; temperature 523 K; thermal anisotropy; thermal management; under-fill materials; vertical direction; Bonding; Conductivity; Copper; Heating; Joints; Thermal conductivity; formatting; insert; style; styling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Packaging and iMAPS All Asia Conference (ICEP-IACC), 2015 International Conference on
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9040-9012-1
  • Type

    conf

  • DOI
    10.1109/ICEP-IAAC.2015.7111079
  • Filename
    7111079