Title : 
Understanding pulsed-cycling variability and endurance in HfOx RRAM
         
        
            Author : 
Balatti, S. ; Ambrogio, S. ; Wang, Z.-Q. ; Sills, S. ; Calderoni, A. ; Ramaswamy, N. ; Ielmini, D.
         
        
            Author_Institution : 
DEIB, Politec. di Milano, Milan, Italy
         
        
        
        
            Abstract : 
Resistive switching memory (RRAM) devices based on metal oxides are receiving strong interest for future high-density stand-alone memories and storage class memories. To explore possible applications of RRAM, the set/reset variability and cycling endurance must be addressed and understood. This work shows a comprehensive study of pulsed-operated variability and endurance in HfOx-RRAM. We analysed the dependence of switching variability on operation current, voltage and pulse-width, providing guidelines to optimize set/reset distributions in oxide RRAM. The impact of pulse-amplitude and pulse-width on cycling endurance is then discussed. The results are explained by a new physics-based model for endurance controlled by defect injection from the bottom electrode during reset.
         
        
            Keywords : 
hafnium compounds; high-k dielectric thin films; resistive RAM; HfOx; bottom electrode; cycling endurance; defect injection; high-density stand-alone memory; metal oxides; physics-based model; pulse-amplitude; pulse-width; pulsed-cycling variability; resistive switching memory devices; set-reset distributions; set-reset variability; storage class memory; Current measurement; Degradation; Electrical resistance measurement; Integrated circuits; Resistance; Switches; Voltage measurement; Resistive switching memory (RRAM); cycling; endurance;
         
        
        
        
            Conference_Titel : 
Reliability Physics Symposium (IRPS), 2015 IEEE International
         
        
            Conference_Location : 
Monterey, CA
         
        
        
            DOI : 
10.1109/IRPS.2015.7112744