DocumentCode :
709855
Title :
A fWLR test structure and method for device reliability monitoring using product relevant circuits
Author :
Vollertsen, R.-P. ; Georgakos, G. ; Kolpin, K. ; Olk, C.
Author_Institution :
Reliability Monitoring, Infineon Technol. AG, Neubiberg, Germany
fYear :
2015
fDate :
19-23 April 2015
Abstract :
The measurement of device degradation in product relevant circuits during production monitoring is described. Ring oscillators with local on-chip heaters are introduced for quick characterization of the voltage and temperature dependence and for fast wafer level reliability (fWLR) monitoring. The suitability of the structures, the equipment and the stress/measurement algorithm is demonstrated. Results for optimizing the stress and readout conditions are shown as well as the relation to standard device stress measurements. The dominating degradation mechanism in this work turned out to be NBTI (negative bias temperature instability).
Keywords :
circuit reliability; circuit testing; negative bias temperature instability; oscillators; NBTI; device degradation; device reliability monitoring; device stress measurements; fWLR test structure; fast wafer level reliability monitoring; negative bias temperature instability; on-chip heaters; product relevant circuits; production monitoring; readout conditions; ring oscillators; Degradation; Monitoring; Ring oscillators; Semiconductor device reliability; Stress; Temperature measurement; NBTI; device degradation; fWLR; reliability; ring oscillator; technology monitoring;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2015 IEEE International
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/IRPS.2015.7112781
Filename :
7112781
Link To Document :
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