DocumentCode :
709873
Title :
Mechanical and thermal stresses characterization maps on cross-sections of forward biased electronic power devices
Author :
Kociniewski, Thierry ; Khatir, Zoubir
Author_Institution :
Groupe d´Etude de la Mater. Condensee, Univ. of Versailles St Quentin, Versailles, France
fYear :
2015
fDate :
19-23 April 2015
Abstract :
Characterization of mechanical and thermal stresses inside the power devices crystal is required for physics of failure analyses of power electronic devices. Recent results have shown the capability to keep this power device functional after cross section. The use of Raman spectroscopy to map mechanical stress and temperature distributions on cross-sections of IGBT (Insulated Gate Bipolar Transistor) devices in forward bias conditions is reported. Mechanical and thermal stresses maps were made in unbiased and forward biased using μ-Raman technique with spatial resolution up to 500nm. Temperature and stress contributions on Raman diffusion were deconvoluted fitting Full Width at Half Maximum (FWHM) and position of the Stokes peak. For the first time, it was possible to quantify experimentally mechanical stress and temperature evolution during operation. These results give experimental data on thermo-mechanical coupling in power devices and are compared with numerical models made with finite elements under ANSYS with a focus on IGBT elementary cell areas.
Keywords :
Raman spectroscopy; failure analysis; finite element analysis; insulated gate bipolar transistors; semiconductor device reliability; temperature distribution; thermal stresses; μ-Raman technique; ANSYS finite element; IGBT devices; IGBT elementary cell area; Raman diffusion; Raman spectroscopy; failure analysis; forward bias condition; forward biased electronic power devices; insulated gate bipolar transistor; mechanical stress characterization map; numerical model; spatial resolution; stress contribution; temperature distribution; thermal stress characterization map; thermo-mechanical coupling; Insulated gate bipolar transistors; Logic gates; Silicon; Stress; Stress measurement; Temperature measurement; Thermal stresses; μ-Raman; Finite element analysis; IGBT; Mechanical stress; cross-section; stress characterizations; thermal mapping;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2015 IEEE International
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/IRPS.2015.7112800
Filename :
7112800
Link To Document :
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