DocumentCode :
710326
Title :
pH sensing characteristics of EGFET based on Pd-doped ZnO thin films synthesized by sol-gel method
Author :
Ali, Ghusoon M. ; Dhaher, Ra´ad H. ; Abdullateef, Ali A.
Author_Institution :
Dept. of Electr. Eng., Univ. of Mustansiriyah, Baghdad, Iraq
fYear :
2015
fDate :
April 29 2015-May 1 2015
Firstpage :
234
Lastpage :
238
Abstract :
This work presents the fabrication and characterization of Palladium-doped Zinc Oxide (Pd-ZnO) thin films for Extended-Gate Field-Effect Transistor (EGFET) pH sensor. The films were fabricated on p-type silicon Si(111) substrates using sol-gel technique. The structure, surface morphology, and electrical properties Pd-ZnO films were studied. The doped ZnO films have uniform, homogenous and free of cracks surfaces. The prepared films were used as pH sensor head to immerse into buffer solutions with different pH. The sensing performance of the fabricated films increased with increasing the doping concentration. The 4% Pd-doped ZnO film based EGFET sensor exhibited voltage sensitivity of 27.86 mV/pH and linearity of 0.97855 in the linear region with pH range from (5-11) which was better than the 2% Pd-doped ZnO based EGFET sensor voltage sensitivity of 24.41 mV/pH and linearity of 0.97746.
Keywords :
II-VI semiconductors; buffer layers; chemical sensors; crack detection; field effect transistors; pH measurement; palladium; semiconductor doping; sol-gel processing; surface morphology; thin film sensors; zinc compounds; EGFET sensor; Si; ZnO:Pd; buffer solutions; crack surface; doping concentration; electrical properties; extended gate field effect transistor; p-type silicon substrate; pH sensing characteristics; pH sensor; sol-gel method; structure morphology; surface morphology; thin film synthesis; voltage sensitivity; Electrodes; Films; Logic gates; Semiconductor device measurement; Sensitivity; Sensors; Zinc oxide; EGFET; Pd-ZnO; pH sensor; sol-gel;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Technological Advances in Electrical, Electronics and Computer Engineering (TAEECE), 2015 Third International Conference on
Conference_Location :
Beirut
Print_ISBN :
978-1-4799-5679-1
Type :
conf
DOI :
10.1109/TAEECE.2015.7113632
Filename :
7113632
Link To Document :
بازگشت