Title :
Road to commercialize ArF technology for Si photonics through wafer-level assessment
Author :
Haifeng Zhou ; Win Kay Thi ; Chen Kok Kiong ; Chao Li ; Huijuan Zhang ; Eu-Jin, Andy Lim ; Mingbin Yu ; Guoqiang Lo
Author_Institution :
Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
Abstract :
The development and assessment of ArF technology in a 200mm FAB line are described. Wafer-level measurement is implemented to explore the dummy pattern effect on cross-wafer uniformity and examine fundamental Si photonics devices.
Keywords :
argon compounds; elemental semiconductors; integrated optics; optical fabrication; optical waveguides; silicon; ArF; ArF technology; FAB line; Si; Si photonics devices; cross-wafer uniformity; dummy pattern effect; size 200 mm; wafer-level assessment; waveguide fabrication; Gratings; Lithography; Optical device fabrication; Optical waveguides; Photonics; Silicon;
Conference_Titel :
Optical Fiber Communications Conference and Exhibition (OFC), 2015
Conference_Location :
Los Angeles, CA
