• DocumentCode
    712854
  • Title

    Investigation of anode-side temperature effect in 1200V FWD cosmic ray failure

  • Author

    Mitsuzuka, Kaname ; Yamada, Shoji ; Takenoiri, Shunji ; Otsuki, Masahito ; Nakagawa, Akio

  • Author_Institution
    Fuji Electr. Co. Ltd., Matsumoto, Japan
  • fYear
    2015
  • fDate
    10-14 May 2015
  • Firstpage
    117
  • Lastpage
    120
  • Abstract
    This paper presents a new cosmic ray failure mechanism of FWDs based on TCAD, and proposes novel FWDs with higher withstanding capability against cosmic rays, which induce device failure. The novel FWDs have a very thin additional P+ layers on the surface of the anode layer to prevent catastrophic temperature rise due to high energy ion irradiation. The high energy Si ions, which are generated by the neutron irradiation, induce high temperature rise in the anode surface. TCAD analysis shows that if the anode surface temperature becomes so high, large minority carrier generation in the surface causes electron current injection from the P+ surface, resulting in high temperature increase and the resultant silicon melting inside FWDs. In the novel FWDs, the temperature rise is suppressed by the additional P+ layer. Experimental verification was also executed to confirm the successful suppression of the device failure by neutron irradiation.
  • Keywords
    anodes; cosmic rays; failure analysis; minority carriers; power semiconductor devices; semiconductor device reliability; technology CAD (electronics); FWD cosmic ray failure; TCAD analysis; anode-side temperature effect; catastrophic temperature rise prevention; device failure suppression; electron current injection; high energy ion irradiation; minority carrier generation; neutron irradiation; silicon melting; voltage 1200 V; Anodes; Charge carrier processes; Ions; Neutrons; Radiation effects; Silicon; Solid modeling; Cosmic-ray; FWDs; Failure rate; Neutron irradiation; Simulation; TCAD;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices & IC's (ISPSD), 2015 IEEE 27th International Symposium on
  • Conference_Location
    Hong Kong
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4799-6259-4
  • Type

    conf

  • DOI
    10.1109/ISPSD.2015.7123403
  • Filename
    7123403