DocumentCode
712860
Title
Fully-isolated NLDMOS behavior investigation during reverse recovery of parasitic diodes
Author
Nan-Ying Yang ; Ming-Cheng Lin ; Haw-Yun Wu ; Wu, C.B. ; Chu, L. ; Lu, H.T. ; Lee, C.Y. ; Jong, Y.C. ; Tsai, J.L. ; Tuan, H.C. ; Kalnitsky, Alex
Author_Institution
Analog / RF & Specialty Technol. Div. (R&D), Taiwan Semicond. Manuf. Co., Ltd., Hsinchu, Taiwan
fYear
2015
fDate
10-14 May 2015
Firstpage
145
Lastpage
148
Abstract
The behavior of the fully-isolated laterally diffused MOSFETs (LDMOS) during reverse recovery of parasitic diodes such as buck converter or white light emitting diode (WLED) driver application was presented. The fully-isolated MOSFETs with parasitic diodes have been realized for high power application, but the related reverse recovery charge (Qrr) model fitting accuracy is still an issue for these devices. Generally, only a single model is used to cover all of the applications. However, Qrr behaviors are different between WLED driver and buck converter. In WLED output stage, two parasitic diodes within high-side switch MOS will be turned on. In buck converter application, there is only one parasitic diode within low-side switch MOS during dead time. We performed the measurement with decoupling Qrr extraction method to fit model under high-side and low-side operations. This resulted in significant Qrr model fitting accuracy improvement by 4 times.
Keywords
light emitting diodes; power MOSFET; semiconductor device models; WLED driver; WLED output stage; buck converter; fully-isolated MOSFET; fully-isolated NLDMOS behavior; laterally diffused MOSFET; low-side switch MOS; model fitting accuracy; parasitic diode reverse recovery; reverse recovery charge model; white light emitting diode; Accuracy; Fitting; Light emitting diodes; MOSFET; Semiconductor device modeling; Semiconductor diodes; Switches; fully-isolated NLDMOS; reverse recovery charge;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices & IC's (ISPSD), 2015 IEEE 27th International Symposium on
Conference_Location
Hong Kong
ISSN
1943-653X
Print_ISBN
978-1-4799-6259-4
Type
conf
DOI
10.1109/ISPSD.2015.7123410
Filename
7123410
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