• DocumentCode
    712873
  • Title

    22 kV SiC Emitter turn-off (ETO) thyristor and its dynamic performance including SOA

  • Author

    Xiaoqing Song ; Huang, Alex Q. ; Mengchia Lee ; Chang Peng ; Lin Cheng ; O´Brien, Heather ; Ogunniyi, Aderin ; Scozzie, Charles ; Palmour, John

  • Author_Institution
    FREEDM Center, North Carolina State Univ., Raleigh, NC, USA
  • fYear
    2015
  • fDate
    10-14 May 2015
  • Firstpage
    277
  • Lastpage
    280
  • Abstract
    Ultra-high voltage (>10 kV) power devices based on SiC are gaining significant attentions since Si power devices are typically at lower voltage levels. In this paper, a world record 22kV Silicon Carbide (SiC) p-type ETO thyristor is developed and reported as a promising candidate for ultra-high voltage applications. The device is based on a 2cm2 22kV p type gate turn off thyristor (p-GTO) structure. Its static as well as dynamic performances are analyzed, including the anode to cathode blocking characteristics, forward conduction characteristics at different temperatures, turn-on and turn-off dynamic performances. The turn-off energy at 6kV, 7kV and 8kV respectively is also presented. In addition, theoretical boundary of the reverse biased safe operation area (RBSOA) of the 22kV SiC ETO is obtained by simulations and the experimental test also demonstrated a wide RBSOA.
  • Keywords
    high-voltage techniques; silicon compounds; thyristor applications; thyristors; wide band gap semiconductors; SiC; anode to cathode blocking characteristics; emitter turn-off thyristor; forward conduction characteristics; reverse biased safe operation area; ultra-high voltage power devices; voltage 22 kV; voltage 6 kV; voltage 7 kV; voltage 8 kV; Anodes; Logic gates; Performance evaluation; Semiconductor optical amplifiers; Silicon; Silicon carbide; Thyristors; ETO; GTO; SOA; SiC; ultra high voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices & IC's (ISPSD), 2015 IEEE 27th International Symposium on
  • Conference_Location
    Hong Kong
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4799-6259-4
  • Type

    conf

  • DOI
    10.1109/ISPSD.2015.7123443
  • Filename
    7123443