DocumentCode :
715971
Title :
Performance evaluation of CMOS-MEMS thermal-piezoresistive resonators in ambient pressure for sensor applications
Author :
Jung-Hao Chang ; Cheng-Syun Li ; Cheng-Chi Chen ; Sheng-Shian Li
Author_Institution :
Dept. of Power Mech. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fYear :
2015
fDate :
12-16 April 2015
Firstpage :
202
Lastpage :
204
Abstract :
In this work, we report a thermally driven and piezoresistively sensed (a.k.a. thermal-piezoresistive) CMOS-MEMS resonator with high quality factor in ambient pressure and with decent power handling capability. The combination of (i) no need of tiny capacitive transducer´s gap spacing thanks to thermal-piezoresistive transduction, (ii) the use of high-Q SiO2/polysilicon structural materials from CMOS back-end-of-line (BEOL), and (iii) the bulk-mode resonator design leads to resonator Q more than 2,000 in ambient pressure and 10,000 in vacuum. Key to attaining sheer Q in ambient pressure relies on significant attenuation of the air damping effect through thermal-piezoresistive transduction as compared to conventional capacitive resonators which necessitate tiny transducer´s gap for reasonable electromechanical coupling. With such high Q and inherent circuit integration capability, the proposed CMOS-MEMS thermal-piezoresistive resonators can potentially be implemented as high sensitivity mass/gas sensors based on resonant transducers. The resonators with center frequency around 5.1 MHz were fabricated using a standard 0.35 μm 2-poly-4-metal (2P4M) CMOS process, thus featuring low cost, batch production, fast turnaround time, easy prototyping, and MEMS/IC integration.
Keywords :
CMOS integrated circuits; damping; integrated circuit design; micromechanical resonators; microsensors; performance evaluation; piezoresistive devices; pressure measurement; pressure sensors; pressure transducers; temperature sensors; 2-poly-4metal CMOS process; 2P4M CMOS process; BEOL; CMOS-MEMS thermal-piezoresistive resonator; MEMS-IC integration; air damping effect; back-end-of-line; bulk-mode resonator design; capacitive resonator; capacitive transducer; electromechanical coupling; high-Q SiO2-polysilicon structural material; mass-gas sensor; performance evaluation; power handling capability; size 0.35 mum; thermal-piezoresistive transduction; thermally driven piezoresistive sensor; CMOS integrated circuits; Micromechanical devices; Piezoresistance; Resonant frequency; Thermal factors; Thermal sensors; CMOS-MEMS; High Q; Mass sensors; Micro-electro-mechanical Systems; Micro-resonators; Piezoresistive sensing; Resonant transducers; Thermal actuation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Frequency Control Symposium & the European Frequency and Time Forum (FCS), 2015 Joint Conference of the IEEE International
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4799-8865-5
Type :
conf
DOI :
10.1109/FCS.2015.7138823
Filename :
7138823
Link To Document :
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