• DocumentCode
    716233
  • Title

    A compact, high-gain Q-band stacked power amplifier in 45nm SOI CMOS with 19.2dBm Psat and 19% PAE

  • Author

    Wei Tai ; Ricketts, David S.

  • Author_Institution
    ECE Dept., Carnegie Mellon Univ., Pittsburgh, PA, USA
  • fYear
    2015
  • fDate
    25-28 Jan. 2015
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    We present a compact, high-gain power amplifier (PA) that achieves high power and high output impedance through a 4-stacked architecture. By proper adjustment of device sizes and bias voltages, the optimum load impedance for maximum Psat is moved close to 50Ohm which eliminates the need for an output matching network. The single-stage PA exhibits a high gain of 16 dB which is more than twice the gain of previously reported PAs and 19.2dBm Psat and 19% PAE which are comparable to the state-of-the-art CMOS PAs at Q-band. The very compact area of 0.09 mm2 and the high gain makes this design a suitable unit PA to be used for further parallel power combining to reach Watt levels of output power.
  • Keywords
    CMOS analogue integrated circuits; field effect MIMIC; millimetre wave power amplifiers; silicon-on-insulator; 4-stacked architecture; Q-band; SOI CMOS PAs; bias voltages; compact high-gain Q-band stacked power amplifier; device sizes; efficiency 19 percent; optimum load impedance; output matching network; parallel power combining; single-stage PA; size 45 nm; CMOS integrated circuits; Gain; Impedance; Logic gates; Power generation; Radio frequency; Semiconductor device measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Amplifiers for Wireless and Radio Applications (PAWR), 2015 IEEE Topical Conference on
  • Conference_Location
    San Diego, CA
  • Type

    conf

  • DOI
    10.1109/PAWR.2015.7139204
  • Filename
    7139204