Title :
Nanostructured multilayer contact system Ti/Mo/Ag for silicon solar cells
Author :
Koval, V. ; Ivashchuk, A. ; Yakymenko, Yu. ; Dusheyko, M. ; Yasievich, Yu. ; Getman, A. ; Mahinko, A.
Author_Institution :
Dept. of Microelectron., Kyiv Polytech. Inst., Kiev, Ukraine
Abstract :
Multilayer contact systems Ti/Ag and Ti/Mo/Ag based on nanostructured Ag thin films were obtained by two different vacuum methods - electron-beam evaporation and RF magnetron sputtering. The influence of production techniques and annealing parameters on grain formation in silver thin films and interdiffusion process between metal contact layers was investigated by means of atomic force microscopy, X-Ray diffraction and mass spectrometry of secondary neutrals. The reduction of sheet resistance for obtained multilayer contacts and accordingly the increasing of short circuit current in silicon heterojunction solar cells were shown.
Keywords :
X-ray diffraction; annealing; atomic force microscopy; chemical interdiffusion; grain growth; mass spectroscopy; metallic thin films; molybdenum; multilayers; nanostructured materials; semiconductor heterojunctions; semiconductor thin films; short-circuit currents; silicon; silver; solar cells; sputtering; titanium; RF magnetron sputtering; Ti-Mo-Ag; X-Ray diffraction; annealing parameters; atomic force microscopy; electron beam evaporation; grain formation; interdiffusion process; mass spectrometry; metal contact layers; nanostructured multilayer contact system; nanostructured thin film; production technique; secondary neutrals; sheet resistance reduction; short circuit current; silicon heterojunction solar cells; vacuum method; Annealing; Nonhomogeneous media; Photovoltaic cells; Silicon; Silver; X-ray diffraction; Ti/Mo/Ag; front contact; multilayer metal system; nanostructured thin film; solar cell;
Conference_Titel :
Electronics and Nanotechnology (ELNANO), 2015 IEEE 35th International Conference on
Conference_Location :
Kiev
DOI :
10.1109/ELNANO.2015.7146852
