Title :
Nanoscale resistive Ni-Ti films obtained by magnetron sputtering
Author :
Vasilev, V.A. ; Khoshev, A.V.
Author_Institution :
Dept. of Instrum. Eng., Penza State Univ., Penza, Russia
Abstract :
The paper considers the application of the method of magnetron sputtering from two sources for the controlled synthesis of nanoscale resistive Ni-Ti films. A description of the technological process of nanoscale Ni-Ti films production is given. Conditions for the films´ receipt with high specific electrical surface resistivity and low temperature coefficient of resistance were defined. The research materials can serve as the basis for developing new resistive elements of measuring instruments (pressure, force, acceleration sensors, etc.) with improved technical characteristics, operating in conditions of high temperatures.
Keywords :
electrical resistivity; metallic thin films; nanostructured materials; nickel alloys; sputter deposition; surface resistance; titanium alloys; Ni-Ti; electrical surface resistivity; high temperatures; magnetron sputtering; nanoscale resistive films; technological process; temperature coefficient of resistance; Magnetic cores; Magnetic films; Nanoscale devices; Nickel; Sputtering; Temperature sensors; N&MEMS; Ni-Ti; magnetron sputtering; thin film;
Conference_Titel :
Control and Communications (SIBCON), 2015 International Siberian Conference on
Conference_Location :
Omsk
Print_ISBN :
978-1-4799-7102-2
DOI :
10.1109/SIBCON.2015.7147013
