• DocumentCode
    720772
  • Title

    Ant colony algorithm for layout decomposition in double/multiple patterning lithography

  • Author

    Xianhua Ke ; Wen, L.V. ; Shiyuan Liu

  • Author_Institution
    State Key Lab. of Digital Manuf. Equip. & Technol., Huazhong Univ. of Sci. & Technol., Wuhan, China
  • fYear
    2015
  • fDate
    15-16 March 2015
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    Double or multiple patterning (DP/MP) lithography is an alternative for the sub-20 nm node and beyond. In MP, it is essential to solve a minimal patterning number to decompose the dense features. While in DP, it is required to remove odd conflict cycles with minimal stitch number. In this work, we apply an ant colony algorithm to address these two issues, respectively.
  • Keywords
    ant colony optimisation; lithography; ant colony algorithm; double patterning lithography; layout decomposition; minimal patterning number; multiple patterning lithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Technology International Conference (CSTIC), 2015 China
  • Conference_Location
    Shanghai
  • ISSN
    2158-2297
  • Type

    conf

  • DOI
    10.1109/CSTIC.2015.7153361
  • Filename
    7153361
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=720772