DocumentCode :
720835
Title :
Sample preparation and improvement for Die Pull test
Author :
Xiali Chen ; Chien, Wei-ting Kary ; Bo Cheng ; Guan Zhang
Author_Institution :
Corp Quality & Reliability Center, Semicond. Manuf. Int. (Shanghai), Corp., China
fYear :
2015
fDate :
15-16 March 2015
Firstpage :
1
Lastpage :
3
Abstract :
With the new BEOL scheme or package technology introduced, the chip and package interaction effect gets more and more concerns and focuses especially for most advanced technologies. To well reflect the impacts of these effects on the real product application performance, a new method of die pull (DP) test is proposed to evaluate the chip internal layer performance for a semiconductor device after back-grinding and die saw. Sample preparation flow, how to get a high successful rate and the failure modes analysis are introduced. Failure modes of DP are studied and robustness of different process splits is evaluated based on DP test. Delamination is not allowed to occur exclusively within Mx (IC) layers after Die Pull test. Process robustness can be judged with much shorter time comparing to traditional environment test. DP test is becoming an important methodology to evaluate the product robustness.
Keywords :
failure analysis; semiconductor device packaging; wafer level packaging; BEOL scheme; chip internal layer; die pull test; failure modes analysis; package technology; sample preparation flow; semiconductor device; Adhesives; Delamination; Films; Integrated circuits; Metals; Robustness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Technology International Conference (CSTIC), 2015 China
Conference_Location :
Shanghai
ISSN :
2158-2297
Type :
conf
DOI :
10.1109/CSTIC.2015.7153446
Filename :
7153446
Link To Document :
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