Title :
Excitations of nonlinear ferromagentic resonance and standing spin wave using inhomogenous high-power RF magnetic field
Author :
Yokotani, Y. ; Yamanoi, K. ; Yakata, S. ; Kimura, T.
Author_Institution :
Dept. of Phys., Kyushu Univ., Fukuoka, Japan
Abstract :
The resonant precession of the magnetizations such as the ferromagnetic resonance (FMR) and spin wave (SW) excitation is unique and attractive property of the ferromagnetic thin film for future applications in nano-electric and telecommunication devices. Especially, after establishing the concept of the spin current, the considerable attention has been paid to such spin dynamics. Moreover, the oscillation amplitude in such resonant spin motion is found to show the nonlinear responses under the high power excitation. These fascinating properties may open novel functional spintronic devices such as spin current amplifier and neuromophic operation. However, experimental difficulties and complicated spatial spin distribution make it difficult to understand the related phenomena deeply. In this presentation, we show that nonlinear responses for the FMR and the surface SW in a Permalloy strip can be simply excited by the application of non-uniform RF magnetic field with high amplitude.
Keywords :
Permalloy; ferromagnetic materials; ferromagnetic resonance; magnetic thin films; magnetisation; metallic thin films; spin dynamics; spin waves; FeNi; Permalloy strip; ferromagnetic thin film; functional spintronic devices; inhomogenous high-power RF magnetic field; magnetization resonant precession; nanoelectric device; neuromophic operation; nonlinear ferromagnetic resonance excitation; nonuniform RF magnetic field; oscillation amplitude; power excitation; resonant spin motion; spatial spin distribution; spin current amplifier; spin dynamics; standing spin wave excitation; surface spin wave; telecommunication device; Magnetic fields; Magnetic resonance; Nonhomogeneous media; Radio frequency; Resistance; Strips;
Conference_Titel :
Magnetics Conference (INTERMAG), 2015 IEEE
Conference_Location :
Beijing
Print_ISBN :
978-1-4799-7321-7
DOI :
10.1109/INTMAG.2015.7156973