Title : 
Artificial fabrication and characterization of L10-ordered FeNi thin films
         
        
            Author : 
Takanashi, K. ; Mizuguchi, M. ; Kojima, T. ; Tashiro, T.
         
        
            Author_Institution : 
Inst. for Mater. Res., Tohoku Univ., Sendai, Japan
         
        
        
        
        
        
            Abstract : 
L10-FeNi, showing uniaxial magnetic anisotropy (Ku) of 1.3×107 erg/cm3 in a bulk sample, is promising as a “rare metal-free” high Ku material. It is known that iron meteorites contain the L10-FeNi phase, what is called “tetrataenite”, which reveals unique magnetic properties different from usual Fe-Ni alloys. However, the artificial fabrication of L10-FeNi is difficult because the order-disorder transformation temperature is low (~320C), and below this temperature the atomic diffusion is extremely slow. In this study, we have tried to fabricate L10-FeNi thin films with high Ku by two methods: molecular beam epitaxy (MBE) and sputtering.
         
        
            Keywords : 
iron alloys; magnetic anisotropy; magnetic thin films; metallic thin films; molecular beam epitaxial growth; nickel alloys; sputter deposition; FeNi; FeNi thin films; artificial fabrication; atomic diffusion; iron meteorites; magnetic properties; molecular beam epitaxy; order-disorder transformation temperature; sputtering; tetrataenite; uniaxial magnetic anisotropy; Annealing; Iron; Magnetization; Molecular beam epitaxial growth; Nickel; Sputtering;
         
        
        
        
            Conference_Titel : 
Magnetics Conference (INTERMAG), 2015 IEEE
         
        
            Conference_Location : 
Beijing
         
        
            Print_ISBN : 
978-1-4799-7321-7
         
        
        
            DOI : 
10.1109/INTMAG.2015.7157055