Artificial fabrication and characterization of L10-ordered FeNi thin films

Author

Takanashi, K. ; Mizuguchi, M. ; Kojima, T. ; Tashiro, T.

Author_Institution

Inst. for Mater. Res., Tohoku Univ., Sendai, Japan

fYear

2015

fDate

11-15 May 2015

Firstpage

1

Lastpage

1

Abstract

L1₀-FeNi, showing uniaxial magnetic anisotropy (K_u) of 1.3×10⁷ erg/cm³ in a bulk sample, is promising as a “rare metal-free” high K_u material. It is known that iron meteorites contain the L1₀-FeNi phase, what is called “tetrataenite”, which reveals unique magnetic properties different from usual Fe-Ni alloys. However, the artificial fabrication of L1₀-FeNi is difficult because the order-disorder transformation temperature is low (~320C), and below this temperature the atomic diffusion is extremely slow. In this study, we have tried to fabricate L1₀-FeNi thin films with high K_u by two methods: molecular beam epitaxy (MBE) and sputtering.

Keywords

iron alloys; magnetic anisotropy; magnetic thin films; metallic thin films; molecular beam epitaxial growth; nickel alloys; sputter deposition; FeNi; FeNi thin films; artificial fabrication; atomic diffusion; iron meteorites; magnetic properties; molecular beam epitaxy; order-disorder transformation temperature; sputtering; tetrataenite; uniaxial magnetic anisotropy; Annealing; Iron; Magnetization; Molecular beam epitaxial growth; Nickel; Sputtering;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference (INTERMAG), 2015 IEEE

Conference_Location

Beijing

Print_ISBN

978-1-4799-7321-7

Type

conf

DOI

10.1109/INTMAG.2015.7157055

Filename

7157055