DocumentCode
722041
Title
CoPt antidot arrays fabricated with dry-etching using AAO templates
Author
Deng, C. ; Qiao, X. ; Wang, F. ; Zeng, H. ; Xu, X.
Author_Institution
Key Lab. of Magn. Mol. & Magn. Inf. Mater. of Minist. of Educ., Shanxi Normal Univ., Linfen, China
fYear
2015
fDate
11-15 May 2015
Firstpage
1
Lastpage
1
Abstract
In this work, we fabricated CoPt/Ag antidot arrays with small size and high areal density, using ultrathin anodic aluminum oxide (AAO) template as a dry etching mask. Ag as an underlayer can reduce the ordering temperature and enhance the (001) texture. Compared to other methods such as direct deposition of a CoPt thin film on AAO templates, this method has the advantage of easily controllable (001) orientation, while the orientation of CoPt films directly deposited on the amorphous AAO template would be random. Direct deposition also cannot obtain a clean antidot array since the deposited material inevitably lands on side walls and/or on the substrate.
Keywords
amorphous state; cobalt alloys; etching; masks; metallic thin films; nanofabrication; nanomagnetics; nanostructured materials; platinum alloys; quantum dots; silver; (001) texture; CoPt film orientation; CoPt thin film; CoPt-Ag; CoPt-Ag antidot arrays; amorphous anodic aluminum oxide template; areal density; direct deposition; dry etching mask; easily controllable (001) orientation; ordering temperature; side walls; ultrathin anodic aluminum oxide template; Amorphous magnetic materials; Films; Magnetic flux; Magnetic hysteresis; Perpendicular magnetic recording; Superconducting magnets;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference (INTERMAG), 2015 IEEE
Conference_Location
Beijing
Print_ISBN
978-1-4799-7321-7
Type
conf
DOI
10.1109/INTMAG.2015.7157326
Filename
7157326
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