• DocumentCode
    722143
  • Title

    Tradeoff of write-ability and erase-ability in overwrite

  • Author

    Lin, E.E. ; Bai, D. ; Liu, F. ; Yuan, S.

  • Author_Institution
    Western Digital, Fremont, CA, USA
  • fYear
    2015
  • fDate
    11-15 May 2015
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    This study analyzes the impact of system´s write-ability and erase-ability on OVW. It characterizes OVW by breaking down writing and erasing processes and varying write stress, data patterns, and writer designs. Some generic OVW trends are characterized. It is also found that the impact of writer design on OVW can be emulated by changing writing stress.
  • Keywords
    magnetic recording; data patterns; erase-ability; erasing process; generic overwrite trends; write-ability; writer designs; writing stress; Magnetic heads; Magnetic recording; Market research; Signal to noise ratio; Stress; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference (INTERMAG), 2015 IEEE
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4799-7321-7
  • Type

    conf

  • DOI
    10.1109/INTMAG.2015.7157464
  • Filename
    7157464