DocumentCode
723081
Title
Coupling capacitance in face-to-face (F2F) bonded 3D ICs: Trends and implications
Author
Taigon Song ; Nieuwoudt, Arthur ; Yun Seop Yu ; Sung Kyu Lim
Author_Institution
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fYear
2015
fDate
26-29 May 2015
Firstpage
529
Lastpage
536
Abstract
Face-to-face (F2F) is a bonding style in three-dimensional integrated circuits (3D ICs) that bonds ICs by using the top-metal (face) as the bonding side when stacking two ICs. As technology scales in F2F bonding, the distance between the ICs becomes as small as few microns. Due to this shorter distance, significant coupling occurs between these ICs. In this paper, we investigate the impact of coupling capacitance when ICs are bonded in a F2F manner. Using a field-solver-based modeling methodology, we examine three critical areas related to F2F parasitics: (1) physical and process factors that impact F2F coupling capacitance, (2) capacitance error when inter-die interactions are not considered, and (3) the impact of micro-bumps on F2F capacitance. The results indicate that F2F separation distances smaller than 10 microns will lead to significant inter-die capacitive interactions that must be considered when extracting F2F bonded 3D ICs.
Keywords
integrated circuit modelling; microassembling; three-dimensional integrated circuits; 3D integrated circuits; F2F bonded 3D IC; F2F bonding; F2F coupling capacitance; F2F parasitics; F2F separation distances; capacitance error; face-to-face bonded 3D IC; field-solver-based modeling methodology; interdie capacitive interactions; interdie interactions; microbumps; Bonding; Capacitance; Couplings; Integrated circuit interconnections; Metals; Testing; Three-dimensional displays;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference (ECTC) , 2015 IEEE 65th
Conference_Location
San Diego, CA
Type
conf
DOI
10.1109/ECTC.2015.7159641
Filename
7159641
Link To Document