Advanced Process Control (APC) and Real Time Dispatch (RTD) system integration for etch depth control process in 300mm Fab

Author

Agrawal, Gaurav K. ; Soon Yoong Loh ; Shebi, Abemelek B.

Author_Institution

GlobalFoundries, Malta, NY, USA

fYear

2015

fDate

3-6 May 2015

Firstpage

390

Lastpage

394

Abstract

Most commonly used feed forward and feedback threaded control algorithms are not always sufficed to achieve the expected process control results. New smaller node sizes and complex process control requirements demand for new and embedded solutions. This paper discusses an advanced integration approach where a complete automation solution was designed and implemented by integrating Real Time Dispatching (RTD) and Advanced Process Control (APC) systems, delivering to complex custom process control requirements for a critical Deep Trench (DT) Poly Stud Recess Etch.

Keywords

automation; process control; real-time systems; APC; RTD; advanced integration approach; advanced process control; complete automation; critical deep trench; etch depth control process; feedback threaded control; feedforward threaded control; poly stud recess etch; real time dispatch; size 300 nm; Databases; Dispatching; Etching; Manufacturing; Message systems; Metrology; Process control; 300mm Semiconductor Manufacturing; APC; Etch; RTD; Run-to-Run; System Integration;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference (ASMC), 2015 26th Annual SEMI

Conference_Location

Saratoga Springs, NY

Type

conf

DOI

10.1109/ASMC.2015.7164426

Filename

7164426