Trace analysis of hydrogen peroxide contamination

Smaller critical dimensions in newer semiconductor technologies and use of lower implant doses continue to increase the importance of monitoring and controlling chemical trace contaminants. This paper presents a case study where contaminants in hydrogen peroxide resulted in an IBM fabricator excursion. Methods for determination of amines and fluoride in hydrogen peroxide were developed. Additionally, closer examination of trace metals in as-received peroxide has led to the identification of contamination sources in transportation via tanker. Lastly, IBM has identified crucial analytical parameters for accurate analysis of trace metallic contamination in hydrogen peroxide. These studies and enhanced methods have led to greater control over hydrogen peroxide quality for use in semiconductor processing.