Automatic metrology algorithm identification using Pattern Matching

The number of measurement points and their types are increasing with the increasing challenges of the new technology nodes. The industry is challenged to enhance and automate the current Design Based Metrology (DBM) recipe generation flow. This paper describes a novel methodology based on Pattern Matching (PM) to automate the flow of assigning the metrology algorithm parameter to each measurement location. Each measurement location in the design space is examined against a pre-populated database of patterns to select the proper metrology algorithm. The proposed technique increases the speed and efficiency of assigning this parameter to each location, and hence increases the speed of CD-SEM recipe generation. This novel flow is expected to ensure consistency between process characterization, modeling, verification and product monitoring and control.