• DocumentCode
    725148
  • Title

    Using fractal dimensions as performance indicators for manufacturing systems

  • Author

    Grau, Gero ; Pabst, Detlef ; Stehli, Marcel

  • Author_Institution
    Manuf. Technol., GLOBALFOUNDRIES, Dresden, Germany
  • fYear
    2015
  • fDate
    3-6 May 2015
  • Firstpage
    272
  • Lastpage
    275
  • Abstract
    Chaos theory has been a young research field with successful applications to a variety of areas. Even though former publications have assessed the question if production systems behave chaotic, little work has been published on real life production systems, especially about semiconductor manufacturing. This paper applies the concept of fractal dimensions to assess the performance of production toolsets and demonstrates fractal dimension as an alternative for graphical analysis of performance indicators. Two examples illustrate the variety of applications and the capability of fractal dimensions to compare different zoom levels and to be tolerant against patterns in the data.
  • Keywords
    chaos; fractals; graph theory; semiconductor device manufacture; chaos theory; fractal dimensions; graphical analysis; manufacturing systems; production systems; semiconductor manufacturing; Chaos; Fractals; Manufacturing systems; Semiconductor device measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference (ASMC), 2015 26th Annual SEMI
  • Conference_Location
    Saratoga Springs, NY
  • Type

    conf

  • DOI
    10.1109/ASMC.2015.7164493
  • Filename
    7164493