DocumentCode
725148
Title
Using fractal dimensions as performance indicators for manufacturing systems
Author
Grau, Gero ; Pabst, Detlef ; Stehli, Marcel
Author_Institution
Manuf. Technol., GLOBALFOUNDRIES, Dresden, Germany
fYear
2015
fDate
3-6 May 2015
Firstpage
272
Lastpage
275
Abstract
Chaos theory has been a young research field with successful applications to a variety of areas. Even though former publications have assessed the question if production systems behave chaotic, little work has been published on real life production systems, especially about semiconductor manufacturing. This paper applies the concept of fractal dimensions to assess the performance of production toolsets and demonstrates fractal dimension as an alternative for graphical analysis of performance indicators. Two examples illustrate the variety of applications and the capability of fractal dimensions to compare different zoom levels and to be tolerant against patterns in the data.
Keywords
chaos; fractals; graph theory; semiconductor device manufacture; chaos theory; fractal dimensions; graphical analysis; manufacturing systems; production systems; semiconductor manufacturing; Chaos; Fractals; Manufacturing systems; Semiconductor device measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference (ASMC), 2015 26th Annual SEMI
Conference_Location
Saratoga Springs, NY
Type
conf
DOI
10.1109/ASMC.2015.7164493
Filename
7164493
Link To Document