DocumentCode
726614
Title
A 600V FS-IGBT using locally isolated P-well structures for improved short circuit ruggedness
Author
Jisun Kim ; Sooseong Kim ; Kwang-Hoon Oh ; Chongman Yun
Author_Institution
TRinno Technol. Co., Ltd., Anyang, South Korea
fYear
2015
fDate
1-5 June 2015
Firstpage
823
Lastpage
828
Abstract
Trench gate field stop (FS) IGBT is widely used in various power applications owing to its low conduction and switching losses. However, the trench gate FS-IGBT induces the high saturation current due to its high cell density so that it deteriorates the short circuit ruggedness, which is essential for the power applications such as welding machines and motor controls. In this paper, a 600V trench gate FS-IGBT having improved short circuit capability is proposed. The proposed IGBT employs locally isolated P-well structure in the active region. Thereby the IGBT shows sufficient short circuit withstanding time with VCE, SAT of 1.5V and EOFF of 25|jJ/A by means of the carrier stored effect.
Keywords
insulated gate bipolar transistors; short-circuit currents; conduction loss; improved short circuit ruggedness; locally isolated P-well structures; saturation current; switching loss; trench gate FS-IGBT; trench gate field stop; voltage 1.5 V; voltage 600 V; Charge carrier processes; Current density; Insulated gate bipolar transistors; Leakage currents; Logic gates; Switches; Switching loss; Carrier stored effect; Isolated P-well; Short circuit ruggedness; Trench gate FS-IGBT;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Electronics and ECCE Asia (ICPE-ECCE Asia), 2015 9th International Conference on
Conference_Location
Seoul
Type
conf
DOI
10.1109/ICPE.2015.7167877
Filename
7167877
Link To Document