DocumentCode :
72753
Title :
\\hbox {Ni/GeO}_{x}\\hbox {/TiO}_{y}\\hbox {/TaN} RRAM on Flexible Substrate With Excellent Resistance Distribution
Author :
Chou, K.I. ; Cheng, C.H. ; Zheng, Z.W. ; Liu, Minggang ; Chin, Alvin
Author_Institution :
Department of Electronics Engineering, National Chiao Tung University, Hsinchu , Taiwan
Volume :
34
Issue :
4
fYear :
2013
fDate :
Apr-13
Firstpage :
505
Lastpage :
507
Abstract :
Excellent device-to-device distribution was achieved in high-performance  \\hbox {Ni/GeO}_{x}\\hbox {/TiO}_{y}\\hbox {/TaN} resistive random access memory on low-cost flexible plastics, with low 30- \\mu\\hbox {W} switching power (9 \\mu\\hbox {A} at 3 V; - \\hbox {1} \\mu\\hbox {A} at - 3 V), \\hbox {10}^{5} cycling endurance, and good retention at 85 ^{\\circ}\\hbox {C} . These were ascribed to bulk transport property by tunneling between traps, forming-free resistive switching, and the less destructive low power switching.
Keywords :
$hbox{TiO}_{y}$; $hbox{GeO}_{x}$ ; Flexible electronics; resistive random access memory (RRAM);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2243814
Filename :
6471736
Link To Document :
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