• DocumentCode
    728713
  • Title

    Investigation on characteristics of resistance change by coexistence of oxygen vacancy and polarization reversal in MOD BaTiO3 ferroelectric thin film

  • Author

    Hashimoto, S. ; Sugie, T. ; Zhang, Z. ; Yamashita, K. ; Noda, M.

  • Author_Institution
    Grad. Sch. Sci. & Tech., Kyoto Inst. of Technol., Kyoto, Japan
  • fYear
    2015
  • fDate
    24-27 May 2015
  • Firstpage
    105
  • Lastpage
    107
  • Abstract
    In this work, we formed MOD BT thin films with chemical stoichiometry then investigated especially with consideration of final annealing condition in order to change the oxygen vacancy and ferroelectric properties. The films annealed in oxygen atmosphere showed the hysteresis of bipolar-type switching with current on/off ratio from 100 to 1000 for the both biases. It was especially noted that abrupt peaks of leakage current density occurred in the resistive hysteresis curve. We estimate that the abrupt increase in current density is the behaviors related to the polarization reversal due to ferroelectricity in the BaTiO3 film. However, the main resistive switching mode was not affected by their behaviors, thus suggesting that the polarization reversal is insufficient to control the total resistive hysteresis.
  • Keywords
    MOCVD; annealing; barium compounds; dielectric hysteresis; dielectric polarisation; electric resistance; electrical conductivity transitions; ferroelectric switching; ferroelectric thin films; stoichiometry; vacancies (crystal); BaTiO3; MOD ferroelectric thin film; annealing condition; bipolar-type switching hysteresis; chemical stoichiometry; current on-off ratio; ferroelectricity; leakage current density; oxygen atmosphere; oxygen vacancy; polarization reversal; resistance change; resistive hysteresis curve; resistive switching mode; total resistive hysteresis; Annealing; Atmosphere; Atmospheric measurements; Films; Hysteresis; Switches; Voltage measurement; BaTiO3; ferroelectricity; final annealing; leakage current; metal-organic-decomposition (MOD); oxygen atmosphere; oxygen vacancy; polarization reversal; resistance random access memory (ReRAM); thin film;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectric, International Symposium on Integrated Functionalities and Piezoelectric Force Microscopy Workshop (ISAF/ISIF/PFM), 2015 Joint IEEE International Symposium on the
  • Conference_Location
    Singapore
  • Type

    conf

  • DOI
    10.1109/ISAF.2015.7172680
  • Filename
    7172680