DocumentCode
728713
Title
Investigation on characteristics of resistance change by coexistence of oxygen vacancy and polarization reversal in MOD BaTiO3 ferroelectric thin film
Author
Hashimoto, S. ; Sugie, T. ; Zhang, Z. ; Yamashita, K. ; Noda, M.
Author_Institution
Grad. Sch. Sci. & Tech., Kyoto Inst. of Technol., Kyoto, Japan
fYear
2015
fDate
24-27 May 2015
Firstpage
105
Lastpage
107
Abstract
In this work, we formed MOD BT thin films with chemical stoichiometry then investigated especially with consideration of final annealing condition in order to change the oxygen vacancy and ferroelectric properties. The films annealed in oxygen atmosphere showed the hysteresis of bipolar-type switching with current on/off ratio from 100 to 1000 for the both biases. It was especially noted that abrupt peaks of leakage current density occurred in the resistive hysteresis curve. We estimate that the abrupt increase in current density is the behaviors related to the polarization reversal due to ferroelectricity in the BaTiO3 film. However, the main resistive switching mode was not affected by their behaviors, thus suggesting that the polarization reversal is insufficient to control the total resistive hysteresis.
Keywords
MOCVD; annealing; barium compounds; dielectric hysteresis; dielectric polarisation; electric resistance; electrical conductivity transitions; ferroelectric switching; ferroelectric thin films; stoichiometry; vacancies (crystal); BaTiO3; MOD ferroelectric thin film; annealing condition; bipolar-type switching hysteresis; chemical stoichiometry; current on-off ratio; ferroelectricity; leakage current density; oxygen atmosphere; oxygen vacancy; polarization reversal; resistance change; resistive hysteresis curve; resistive switching mode; total resistive hysteresis; Annealing; Atmosphere; Atmospheric measurements; Films; Hysteresis; Switches; Voltage measurement; BaTiO3 ; ferroelectricity; final annealing; leakage current; metal-organic-decomposition (MOD); oxygen atmosphere; oxygen vacancy; polarization reversal; resistance random access memory (ReRAM); thin film;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectric, International Symposium on Integrated Functionalities and Piezoelectric Force Microscopy Workshop (ISAF/ISIF/PFM), 2015 Joint IEEE International Symposium on the
Conference_Location
Singapore
Type
conf
DOI
10.1109/ISAF.2015.7172680
Filename
7172680
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