DocumentCode :
728792
Title :
Effects of deposition inclination angle on the mechanical, optical and electrical characteristics of Al-doped ZnO films
Author :
Tse-Chang Li ; Jen-Fin Lin
Author_Institution :
Dept. of Mech. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
fYear :
2015
fDate :
1-4 July 2015
Firstpage :
151
Lastpage :
154
Abstract :
A flat plate in the deposition stage is designed to be tilted flexibly to form an inclination angle between an ion beam and the direction normal to a polyethylene terephthalate (PET) substrate. Five kinds of PET/aluminum-doped zinc oxide specimen were prepared to examine the effects of inclination angle on the mechanical, optical and electrical properties. Increase in the inclination angle is advantageous for the increase in thin film porosity before reaching its asymptotic value. An appropriate choice in a nonzero inclination angle can increase the mechanical properties in hardness and reduced module and carrier concentration, and decrease the carrier mobility and electrical resistivity of the specimen greatly in a simple way.
Keywords :
II-VI semiconductors; aluminium; carrier density; carrier mobility; electrical resistivity; hardness; porosity; semiconductor thin films; sputter deposition; wide band gap semiconductors; zinc compounds; Al-doped ZnO films; ZnO:Al; carrier concentration; carrier mobility; electrical characteristics; electrical resistivity; film porosity; hardness; mechanical characteristics; nonzero inclination angle; optical characteristics; polyethylene terephthalate substrate; II-VI semiconductor materials; Mechanical factors; Optical films; Positron emission tomography; Substrates; Zinc oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2015 22nd International Workshop on
Conference_Location :
Kyoto
Type :
conf
DOI :
10.1109/AM-FPD.2015.7173228
Filename :
7173228
Link To Document :
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