Title :
Design-for-Manufacturability Assessment for Integrated Circuits Using RADAR
Author :
Wing Chiu Tam ; Blanton, Shawn
Author_Institution :
Electr. & Comput. Eng. Dept., Carnegie Mellon Univ., Pittsburgh, PA, USA
Abstract :
Design for manufacturability (DFM) is essential because of the formidable challenges encountered in nano-scale integrated circuit (IC) fabrication. Unfortunately, it is difficult for designers to understand the cost-benefit tradeoff when tuning their design through DFM to achieve better manufacturability. This paper attempts to assist the designer in meeting this challenge by providing a methodology, called rule assessment of defect-affected regions (RADAR), which uses failing-IC diagnosis results to systematically evaluate the effectiveness of DFM rules. RADAR is applied to the fail data from a 90 nm Nvidia graphics processing unit to demonstrate its viability. Specifically, evaluation of various DFM rules revealed that via-enclosure rules play a more important role than the density-related rules. The yield impact of resolving violations is also quantified. In addition, comprehensive simulation experiments have shown RADAR to be accurate and effective for performing DFM evaluation.
Keywords :
circuit tuning; design for manufacture; integrated circuit design; integrated circuit manufacture; nanoelectronics; nanofabrication; DFM; IC fabrication; Nvidia graphics processing unit; RADAR; cost-benefit tradeoff; density-related rules; design-for-manufacturability assessment; failing-IC diagnosis; integrated circuits; nanoscale integrated circuit fabrication; rule assessment of defect-affected regions; size 90 nm; via-enclosure rules; Accuracy; Fabrication; Integrated circuits; Layout; Radar; Statistical analysis; Systematics; Design for manufacturability (DFM); diagnosis; recommended design rules; yield modeling;
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
DOI :
10.1109/TCAD.2014.2336216