Title :
Simulation of ion redistribution in a vacuum chamber during magnetron sputtering of coatings
Author :
Saifullin, Elmir R.
Author_Institution :
Nat. Res. Tomsk State Univ., Tomsk, Russia
Abstract :
A model is suggested to describe ion redistribution in a vacuum chamber during magnetron sputtering of a two-component coating. Magnetron sputtering is a technology for depositing thin films on a substrate using a cathodic sputtering target in a magnetron plasma discharge.
Keywords :
coatings; sputter deposition; thin films; cathodic sputtering target; depositing thin films; ion redistribution; magnetron plasma discharge; magnetron sputtering; two-component coating; vacuum chamber; Angular velocity; Coatings; Magnetic films; Mathematical model; Numerical models; Sputtering; Substrates;
Conference_Titel :
Plasma Sciences (ICOPS), 2015 IEEE International Conference on
Conference_Location :
Antalya
DOI :
10.1109/PLASMA.2015.7179552
