Electron source based on the LTD and plasma-filled diode

Summary form only given. Power increase of high current relativistic electron beam is related to the necessary increase in the current density. Plasma-filled diode concept looks promising from that point view. Electron beam generation occurs in a plasma-filled diode in a double sheath with plasma as an anode boundary. It provides smaller accelerated gap, lower impedance and larger current density than it possible with a vacuum diode for a given voltage. It also provides possibility to exclude the anode foils, separating regions of the beam generation and transportation to target.Experimental results have proven realization of a powerful electron source on the base of a plasma-filled diode. Maximum output voltage and power are received using the single plasma channel of the small diameter, allowing to realize a high linear current density in the diode. Using the plasma channel in diameter of 1 cm, voltage of MV range is received in the diode at a current up to 150 kA and duration of low-impedance phase of 100-150 ns. Possibility of use in the diode of independent parallel plasma channels of small diameter is shown for current increasing. Design of a sectioned plasma-filled diode is introduced without metal anode before the transport region on the common target. Experimental results have confirmed feasibility of a powerful electron source with ~1 MA current and ~1 MV voltage on the basis plasma-filled diode. Low impedance generators, such as linear transformer driver (LTD) without transformer oil and pressurized gas switches could be employed as drivers for the plasma-filled diode.