DocumentCode :
731295
Title :
Inductively coupled plasma for graphene production
Author :
Durmaz, Yakup ; Bozduman, Ferhat ; Koc, I. Umran ; Ismael, Mohammed ; Nore, Sabah ; Gulec, Ali ; Oksuz, Lutfi
Author_Institution :
Phys. Dept., Suleyman Demirel Univ., Isparta, Turkey
fYear :
2015
fDate :
24-28 May 2015
Firstpage :
1
Lastpage :
1
Abstract :
This study is investigating the direct growth of graphene on a membrane filter and a copper surface by injecting ethanol vapor into an inductively coupled plasma (ICP) at atmospheric pressure. Low temperature (<;1000) graphene production is possible by an ICP plasma [1]. The discharge chemical mechanism will be analyzed by optical emission spectrum. The effects of the temperature and the plasma power on graphene sheets will be analyzed by SEM, AFM and Raman spectra.
Keywords :
Raman spectra; atomic force microscopy; discharges (electric); graphene; membranes; plasma diagnostics; plasma materials processing; plasma temperature; scanning electron microscopy; AFM; C; Cu; ICP plasma; Raman spectra; SEM; atmospheric pressure; copper surface; discharge chemical mechanism; ethanol vapor injection; graphene direct growth; graphene sheets; inductively coupled plasma; low-temperature graphene production; membrane filter; optical emission spectra; plasma power; pressure 1 atm; temperature effects; Copper; Graphene; Iterative closest point algorithm; Optical filters; Plasma temperature; Production;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Sciences (ICOPS), 2015 IEEE International Conference on
Conference_Location :
Antalya
Type :
conf
DOI :
10.1109/PLASMA.2015.7179803
Filename :
7179803
Link To Document :
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