DocumentCode :
732535
Title :
Status and potential of laser based EUV sources
Author :
Endo, Akira
Author_Institution :
HiLase Center, Inst. of Phys., Dolni Brezany, Czech Republic
fYear :
2015
fDate :
10-15 May 2015
Firstpage :
1
Lastpage :
2
Abstract :
The established EUV source for lithography is driven by a high average power pulsed CO2 laser. Micro droplet of Tin is injected as the plasma source. Present average power is more than 100W, and the scaling potential to over kW is described regarding several physical limits.
Keywords :
laser materials processing; photolithography; plasma sources; ultraviolet sources; high average power pulsed carbon dioxide laser; laser based EUV sources; lithography; plasma source; tin microdroplet; Apertures; Lithography; Optical reflection; Plasmas; Reflectivity; Tin; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2015 Conference on
Conference_Location :
San Jose, CA
Type :
conf
Filename :
7182968
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=732535
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