• DocumentCode
    733357
  • Title

    Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography

  • Author

    Dengxin Ji ; Borui Chen ; Xie Zeng ; Moein, Tania ; Haomin Song ; Qiaoqiang Gan ; Cartwright, Alexander

  • Author_Institution
    Dept. of Electr. Eng., State Univ. of New York at Buffalo, Buffalo, NY, USA
  • fYear
    2015
  • fDate
    10-15 May 2015
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.
  • Keywords
    nanofabrication; nanolithography; optical fabrication; large area flat metallic surfaces; modified atomic-layer lithography; nanostructures fabrication; strongly localized field enhancement; sub-10-nm gaps; Fabrication; Films; Gratings; Lithography; Metals; Scanning electron microscopy; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2015 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    7183795
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=733357