Title :
Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography
Author :
Dengxin Ji ; Borui Chen ; Xie Zeng ; Moein, Tania ; Haomin Song ; Qiaoqiang Gan ; Cartwright, Alexander
Author_Institution :
Dept. of Electr. Eng., State Univ. of New York at Buffalo, Buffalo, NY, USA
Abstract :
We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.
Keywords :
nanofabrication; nanolithography; optical fabrication; large area flat metallic surfaces; modified atomic-layer lithography; nanostructures fabrication; strongly localized field enhancement; sub-10-nm gaps; Fabrication; Films; Gratings; Lithography; Metals; Scanning electron microscopy; Surface treatment;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2015 Conference on
Conference_Location :
San Jose, CA
