• DocumentCode
    733585
  • Title

    Improvement of silicon dioxide ridge waveguides using low temperature thermal annealing

  • Author

    Parks, J.W. ; Cai, H. ; Wall, T. ; Stott, M. ; Hamilton, E. ; Chu, R. ; Hawkins, A.R. ; Schmidt, H.

  • Author_Institution
    Sch. of Eng., Univ. of California, Santa Cruz, Santa Cruz, CA, USA
  • fYear
    2015
  • fDate
    10-15 May 2015
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Penetration of liquids into SiO2 ridge waveguides during standard processing steps is shown to cause poor mode confinement and increased loss. Thermal annealing repeatedly restores a core with uniform index and low-loss mode confinement.
  • Keywords
    annealing; optical losses; optical waveguides; refractive index; ridge waveguides; silicon compounds; SiO2; low temperature thermal annealing; low-loss mode confinement; refractive index; silicon dioxide ridge waveguides; Annealing; Indexes; Liquid waveguides; Liquids; Optical waveguides; Semiconductor waveguides; Silicon compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2015 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    7184026
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=733585