DocumentCode :
738548
Title :
Self-Heat Characterizations and Modeling of Multifinger nMOSFETs for RF-CMOS Applications
Author :
Aoki, Hitoshi ; Kobayashi, Haruo
Author_Institution :
Div. of Electron. & Inf., Gunma Univ., Kiryu, Japan
Volume :
62
Issue :
9
fYear :
2015
Firstpage :
2704
Lastpage :
2709
Abstract :
The purpose of this paper is to characterize and model the self-heating effect (SHE) of multifinger n-channel MOSFETs (nMOSFETs). The amount of SHE is small enough not to be analyzed for single-finger bulk CMOS devices. However, SHE should be considered for multifinger nMOSFETs that are mainly used for RF-CMOS applications. The SHE mechanism was analyzed based on a 2-D device simulator. SHE model equations are derived and implemented in the BSIM6 model with Verilog-A language used in a SPICE simulator. The model improves speed and accuracy of multifinger nMOSFETs simulations. To extract thermal resistance and capacitance, an advanced ac conductance method using a vector network analyzer is developed to obtain Ids-Vds measurement without increasing temperatures with the proposed model and extracted parameters, excellent agreement has been obtained between measurements and simulations in dc and S-parameter domain, whereas the original BSIM6 shows inconsistency between the static dc and the small signal ac simulations due to the lack of SHE. Unlike the widely used subcircuits-based SHE models, including Silicon-On-Insulator MOSFET and power MOSFET models, the proposed SHE model can converge in large-scale circuits even for transient simulations.
Keywords :
MOSFET; S-parameters; network analysers; semiconductor device models; RF-CMOS applications; S-parameter domain; SPICE simulator; Verilog-A language; multifinger nMOSFET; self-heat characterizations; self-heating effect; vector network analyzer; Current measurement; Integrated circuit modeling; MOSFET; Mathematical model; Semiconductor device modeling; Temperature measurement; Transmission line measurements; Modeling; RF-CMOS; multifinger; self-heating; shallow trench isolation (STI); shallow trench isolation (STI).;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2446498
Filename :
7160729
Link To Document :
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