DocumentCode :
739495
Title :
High- {Q} Inductors Utilizing Thick Metals and Dense-Tapered Spirals
Author :
Vanukuru, Venkata Narayana Rao
Author_Institution :
Semicond. R&D Center, IBM India Pvt. Ltd., Bangalore, India
Volume :
62
Issue :
9
fYear :
2015
Firstpage :
3095
Lastpage :
3099
Abstract :
Ultra-thick metals are known to be counter productive for quality factor (Q) improvement at high frequencies in multiturn inductors. From the experimental results, assisted by electromagnetic simulations, it is first shown that Q improvement with ultra-thick metals can be pushed to higher frequencies using variable width and spaced (tapered) spirals. Furthermore, it is also shown that the extent of tapering is proportional to the metal thickness for the highest performance. Second, dense-tapered layouts are shown to be good candidates for higher Q rather than hollow ones for a given inductance density.
Keywords :
Q-factor; inductors; dense tapered layouts; dense tapered spirals; high-Q inductors; multiturn inductor; quality factor; thick metals; Conductivity; Inductance; Inductors; Metals; Proximity effects; Spirals; Substrates; Current handling; fill factor (FF); proximity effect; quality factor; reverse excitation; self-resonant frequency (SRF); skin effect; tapered inductor; tapered inductor.;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2458772
Filename :
7175016
Link To Document :
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