DocumentCode :
740207
Title :
Characteristics of Polycrystalline Si Thin Film—Solid Solubility and Mobility Study
Author :
Shu Qin
Author_Institution :
Micron Technol. Inc., Boise, ID, USA
Volume :
62
Issue :
9
fYear :
2015
Firstpage :
2724
Lastpage :
2729
Abstract :
Carrier solid solubility (SS) and mobility of polycrystalline silicon (poly-Si) thin film as the functions of the doping ion species and annealing conditions (temperature and time) are characterized. The study of SS and mobility shows that the poly-Si thin film has lower chemical SS and electrically active SS and much lower mobility (μ) than a single-crystalline Si substrate, because polygrain boundaries dominate carrier scattering mechanism. For the poly-Si thin film, doping ion species show relatively less impact on SS and mobility data, but annealing thermal budgets (temperature and time) show more impact on SS and mobility data.
Keywords :
annealing; carrier mobility; elemental semiconductors; grain boundaries; semiconductor doping; semiconductor thin films; silicon; solubility; Si; annealing; carrier scattering mechanism; carrier solid mobility; carrier solid solubility; doping ion species; polycrystalline silicon thin film; polygrain boundaries; single-crystalline substrate; Annealing; Cascading style sheets; Grain size; Implants; Impurities; Silicon; Temperature measurement; Grain boundary; mobility; polycrystalline silicon (poly-Si) thin film; polygrain size; solid solubility (SS); solid solubility (SS).;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2454441
Filename :
7202871
Link To Document :
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