DocumentCode :
741082
Title :
Thermal expansion of III–V materials in atomistic models using empirical Tersoff potentials
Author :
Detz, H.
Author_Institution :
AT & Center of Micro- & Nanostruct., Vienna Univ. of Technol., Vienna, Austria
Volume :
51
Issue :
18
fYear :
2015
Firstpage :
1455
Lastpage :
1457
Abstract :
A method to achieve realistic values for the thermal expansion coefficient in atomistic simulations of III-V materials using empirical Tersoff potentials is reported. The acceptance criterion of the Metropolis Monte Carlo algorithm that is used to relax the structures is modified to suppress exceedingly high thermal expansion, which has previously been observed for Tersoff potentials of III-V materials. Compared with earlier works, the error is reduced from more than 200% to ~3% for GaAs. Similar behaviour is found for other binary III-V compounds with errors typically around 10% with respect to the experimental data.
Keywords :
III-V semiconductors; Monte Carlo methods; thermal expansion; atomistic models; binary III-V compounds; empirical Tersoff potentials; metropolis Monte Carlo algorithm; thermal expansion coefficient;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2015.1302
Filename :
7229505
Link To Document :
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