Title :
Monolithic Integration of Si3N4 Microring Filters With Bulk CMOS IC Through Post-Backend Process
Author :
Zan Zhang ; Beiju Huang ; Xu Zhang ; Zanyun Zhang ; Chuantong Cheng ; Xurui Mao ; Sijie Liu ; Hongda Chen
Author_Institution :
State Key Lab. of Integrated Optoelectron., Inst. of Semicond., Beijing, China
Abstract :
An experimental demonstration of backend monolithic integration of Si3N4 microring filter with bulk complementary metal-oxide-semiconductor (CMOS) integrated circuit (IC) is accomplished using CMOS postbackend process. Si3N4 photonic layer is integrated on the top surface of CMOS IC die which is manufactured in commercial CMOS foundry. The Si3N4 microring filters in photonic layer are fabricated using CMOS postbackend process with only two additional lithography steps. The filters can be thermally tuned by microheaters integrated in CMOS circuits, which are controlled by transmission gates. A measured optical transmission spectrum and a dynamic characteristic of the integrated filter are provided.
Keywords :
CMOS integrated circuits; integrated optics; integrated optoelectronics; light transmission; micro-optics; optical filters; photolithography; silicon compounds; CMOS IC die; CMOS foundry; CMOS postbackend process; Si3N4; Si3N4 microring filters; Si3N4 photonic layer; backend monolithic integration; bulk CMOS IC; bulk complementary metal-oxide-semiconductor integrated circuit; dynamic characteristic; integrated filter; lithography steps; microheaters; optical transmission spectrum; post-backend process; transmission gates; CMOS integrated circuits; CMOS technology; Optical filters; Optical waveguides; Photonics; Resonator filters; CMOS technology; Integrated optoelectronics; silicon nitride; silicon photonics;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2015.2429677
