Title :
A Novel Robust and Low-Leakage SRAM Cell With Nine Carbon Nanotube Transistors
Author :
Yanan Sun ; Hailong Jiao ; Kursun, Volkan
Author_Institution :
Dept. of Electron. & Comput. Eng., Hong Kong Univ. of Sci. & Technol., Hong Kong, China
Abstract :
A novel static random-access memory (SRAM) cell with nine carbon nanotube MOSFETs (9-CN-MOSFETs) is proposed in this paper. With the new 9-CN-MOSFET SRAM cell, the read data stability is enhanced by 99.09%, while providing similar read speed as compared with the conventional six-transistor (6T) SRAM cell in a 16-nm carbon nanotube transistor technology. The worst-case write voltage margin is increased by 4.57× and 3.90× with the proposed 9-CN-MOSFET SRAM cell as compared with the conventional 6T SRAM cell and a previously published eight-transistor (8T) SRAM cell, respectively. A 1 Kibit SRAM array with the new memory cells consumes 34.18% and 12.27% lower leakage power as compared with the memory arrays with 6T and 8T SRAM cells, respectively, in idle mode. The overall electrical quality is enhanced by up to 13.63× with the proposed 9-CN-MOSFET memory circuit as compared with the other memory cells that are evaluated in this paper.
Keywords :
MOSFET; SRAM chips; carbon nanotube field effect transistors; 9-CN-MOSFET memory circuit; C; low-leakage SRAM cell; memory cells; nine carbon nanotube MOSFET; nine carbon nanotube transistors; read data stability; robust SRAM cell; size 16 nm; static random-access memory; storage capacity 1 Kbit; worst-case write voltage margin; Arrays; Carbon nanotubes; Circuit stability; Electron tubes; SRAM cells; Transistors; Carbon based electronics; carbon nanotube transistor technology; electron mobility; hole mobility; leakage power consumption; memory; noise immunity; read static noise margin; write voltage margin;
Journal_Title :
Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
DOI :
10.1109/TVLSI.2014.2350674