DocumentCode :
745022
Title :
Investigation of electron-hole generation in MOS capacitors on 4H SiC
Author :
Cheong, Kuan Yew ; Dimitrijev, Sima ; Han, Jisheng
Author_Institution :
Sch. of Microelectron. Eng., Griffith Univ., Brisbane, Qld., Australia
Volume :
50
Issue :
6
fYear :
2003
fDate :
6/1/2003 12:00:00 AM
Firstpage :
1433
Lastpage :
1439
Abstract :
This paper investigates electron-hole generation in n-type MOS capacitors on 4H-SiC with the gate oxide directly grown in either 100% NO or 10% N2O. High-temperature capacitance-transient measurements were used to determine and compare the contributions of carrier generation in the bulk and at the SiO2-SiC interface. The effective generation rate in the bulk is similar in the MOS capacitors with either type of gate oxide, whereas the effective surface-generation rate is much lower in the case of oxides grown in 100% NO. Moreover, the effective surface-generation rate in these oxides is reduced to the level that is comparable to the effective bulk-generation rate. This result demonstrates the high quality of MOS capacitors with the gate oxide directly grown in 100% NO.
Keywords :
MOS capacitors; carrier lifetime; interface states; minority carriers; semiconductor-insulator boundaries; silicon compounds; surface recombination; wide band gap semiconductors; 4H-SiC; N2O; NO; SiO2-SiC; SiO2-SiC interface; bulk carrier generation; carrier generation; charge-retention time; effective generation rate; electron-hole generation; gate oxide; high-temperature capacitance-transient measurements; interface-trap density; n-type MOS capacitors; surface carrier generation; Australia; Capacitance measurement; Leakage current; MOS capacitors; Microelectronics; Nonvolatile memory; Random access memory; Scholarships; Silicon carbide; Temperature measurement;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2003.813346
Filename :
1213813
Link To Document :
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