DocumentCode :
746071
Title :
A very high precision 500-nA CMOS floating-gate analog voltage reference
Author :
Ahuja, Bhupendra K. ; Vu, Hoa ; Laber, Carlos A. ; Owen, William H.
Author_Institution :
Intersil Corp., Milpitas, CA, USA
Volume :
40
Issue :
12
fYear :
2005
Firstpage :
2364
Lastpage :
2372
Abstract :
A floating gate with stored charge technique has been used to implement a precision voltage reference achieving a temperature coefficient (TC) <1 ppm/°C in CMOS technology. A Fowler-Nordheim tunnel device used as a switch and a poly-poly capacitor form the basis in this reference. Differential dual floating gate architecture helps in achieving extremely low temperature coefficients, and improving power supply rejection. The reference is factory programmed to any value without any trim circuits to within 200 μV of its specified value. The floating-gate analog voltage reference (FGAREF) shows a long-term drift of less than 10 ppm/√1000 h. This circuit is ideal for portable and handheld applications with a total current of only 500 nA. This is done by biasing the buffer amplifier in the subthreshold region of operation. It is fabricated using a 25-V 1.5-μm E2PROM CMOS technology.
Keywords :
CMOS analogue integrated circuits; amplifiers; buffer circuits; reference circuits; tunnel diodes; 1.5 micron; 25 V; 500 nA; CMOS technology; EEPROM; Fowler-Nordheim tunnel device; dual floating gate architecture; floating-gate analog voltage reference; poly-poly capacitor; power supply rejection; temperature coefficient; tunnel diode; CMOS technology; Capacitors; Circuits; Operational amplifiers; PROM; Power supplies; Production facilities; Switches; Temperature; Voltage; Bandgap; EEPROM; FGAREF; drift; floating gate; reference voltage; subthreshold; temperature coefficient; tunnel diode;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.2005.856268
Filename :
1546213
Link To Document :
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