• DocumentCode
    74767
  • Title

    RF Operation of Hydrogen-Terminated Diamond Field Effect Transistors: A Comparative Study

  • Author

    Russell, Stephen ; Sharabi, Salah ; Tallaire, Alexandre ; Moran, David A. J.

  • Author_Institution
    Sch. of Eng., Univ. of Warwick, Coventry, UK
  • Volume
    62
  • Issue
    3
  • fYear
    2015
  • fDate
    Mar-15
  • Firstpage
    751
  • Lastpage
    756
  • Abstract
    Three sets of different gate-length field-effect transistors (250, 120, and 50 nm) have been defined on homoepitaxial hydrogen-terminated diamond with the 50-nm device being the smallest gate length diamond transistor fabricated to date. DC- and small-signal RF measurements were undertaken to compare the operation of these gate nodes. RF small-signal equivalent circuits were generated to contrast individual components and better understand the operation at various gate dimensions. Scaling the gate length to smaller dimensions leads to an increase in the cutoff frequency of these devices although parasitic elements are found to dominate at the shortest gate length of 50 nm, limiting the outstanding potential of these devices.
  • Keywords
    diamond; epitaxial layers; hydrogen; microwave field effect transistors; millimetre wave field effect transistors; C:H; DC signal; RF operation; RF small-signal equivalent circuits; cutoff frequency; gate dimensions; gate-length field-effect transistors; homoepitaxial hydrogen-terminated diamond; hydrogen-terminated diamond field effect transistors; parasitic elements; size 50 nm to 250 nm; small-signal RF measurements; Current measurement; Diamonds; Field effect transistors; Gold; Logic gates; Radio frequency; Resistance; Field-effect transistor (FET); RF performance; homoepitaxial diamond; hydrogen terminated;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2015.2392798
  • Filename
    7046524