DocumentCode :
74767
Title :
RF Operation of Hydrogen-Terminated Diamond Field Effect Transistors: A Comparative Study
Author :
Russell, Stephen ; Sharabi, Salah ; Tallaire, Alexandre ; Moran, David A. J.
Author_Institution :
Sch. of Eng., Univ. of Warwick, Coventry, UK
Volume :
62
Issue :
3
fYear :
2015
fDate :
Mar-15
Firstpage :
751
Lastpage :
756
Abstract :
Three sets of different gate-length field-effect transistors (250, 120, and 50 nm) have been defined on homoepitaxial hydrogen-terminated diamond with the 50-nm device being the smallest gate length diamond transistor fabricated to date. DC- and small-signal RF measurements were undertaken to compare the operation of these gate nodes. RF small-signal equivalent circuits were generated to contrast individual components and better understand the operation at various gate dimensions. Scaling the gate length to smaller dimensions leads to an increase in the cutoff frequency of these devices although parasitic elements are found to dominate at the shortest gate length of 50 nm, limiting the outstanding potential of these devices.
Keywords :
diamond; epitaxial layers; hydrogen; microwave field effect transistors; millimetre wave field effect transistors; C:H; DC signal; RF operation; RF small-signal equivalent circuits; cutoff frequency; gate dimensions; gate-length field-effect transistors; homoepitaxial hydrogen-terminated diamond; hydrogen-terminated diamond field effect transistors; parasitic elements; size 50 nm to 250 nm; small-signal RF measurements; Current measurement; Diamonds; Field effect transistors; Gold; Logic gates; Radio frequency; Resistance; Field-effect transistor (FET); RF performance; homoepitaxial diamond; hydrogen terminated;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2392798
Filename :
7046524
Link To Document :
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