DocumentCode :
74788
Title :
Femtogram aerosol nanoparticle mass sensing utilising vertical silicon nanowire resonators
Author :
Wasisto, Hutomo Suryo ; Merzsch, Stephan ; Stranz, Andrej ; Waag, Andreas ; Uhde, Erik ; Salthammer, Tunga ; Peiner, Erwin
Author_Institution :
Inst. of Semicond. Technol. (IHT), Tech. Univ. Braunschweig, Braunschweig, Germany
Volume :
8
Issue :
10
fYear :
2013
fDate :
Oct. 2013
Firstpage :
554
Lastpage :
558
Abstract :
Vertically aligned silicon nanowire (SiNW)-based resonators were fabricated and utilised to detect aerosol nanoparticles (NPs) by measuring their resonant frequency shifts caused by the additional mass of trapped NPs. Inductively coupled plasma cryogenic dry etching and multiple thermal oxidations are used in the fabrication of silicon nanowire (SiNW) arrays. The SiNWs were coated with gold for contacting to the homebuilt electrostatic NP sampler to collect the flowing NPs. In order to have a dynamic resonance operation in the frequency measurement system, a piezoelectric shear actuator was mounted onto the SiNWs. Examined in a TiO2 aerosol sampling with a total concentration of ~8500 NP/cm3, the fabricated sensor exhibited its feasibility as a nanobalance to measure aerosol NP mass at the femtogram level with a mass sensitivity of 7.1 Hz/fg and a mass resolution of 31.6 fg. The NP sampling efficiency of the developed miniaturised NP sampler was found to be three times higher than that of the commercial nanometer aerosol sampler (NAS, TSI 3089). An ultrasonic removal method was used to detach the adhered NPs and further extend the operating life of the sensor.
Keywords :
aerosols; balances; cryogenics; elemental semiconductors; frequency measurement; mass measurement; nanofabrication; nanoparticles; nanosensors; nanowires; piezoceramics; piezoelectric actuators; resonators; sensor arrays; silicon; sputter etching; titanium compounds; Si; SiNW array; TiO2; aerosol NP mass measurement; coating technique; dynamic resonance operation; femtogram aerosol nanoparticle mass sensor; homebuilt electrostatic NP sampler; inductively coupled plasma cryogenic dry etching; mass resolution; mass sensitivity; nanobalance; nanofabrication; piezoelectric shear actuator; resonant frequency shift measurement; silicon nanowire resonator; thermal oxidation; ultrasonic removal method;
fLanguage :
English
Journal_Title :
Micro & Nano Letters, IET
Publisher :
iet
ISSN :
1750-0443
Type :
jour
DOI :
10.1049/mnl.2013.0208
Filename :
6651443
Link To Document :
بازگشت