DocumentCode :
748212
Title :
In-pixel autoexposure CMOS APS
Author :
Yadid-Pecht, Orly ; Belenky, Alexander
Author_Institution :
VLSI Syst. Center, Ben-Gurion Univ., Beer-Sheva, Israel
Volume :
38
Issue :
8
fYear :
2003
Firstpage :
1425
Lastpage :
1428
Abstract :
A CMOS active pixel sensor (APS) with in-pixel autoexposure and a wide dynamic-range linear output is described. The chip features a unique architecture enabling a customized number of additional bits per pixel per readout, with minimal effect on the sensor spatial or temporal resolution. By utilizing multiple readouts via real-time feedback, each pixel in the field of view can automatically set an independent exposure time, according to its illumination. A customized, large increase in the dynamic range can be achieved and a scene containing both bright and dark regions can be captured. A prototype of 64 × 64 pixels has been fabricated using 1-poly 3-metal CMOS 0.5 μm n-well process available through MOSIS. Power dissipation is 3.7 mW at VDD = 5 V. The special functions have been verified experimentally, and an increase of 2 bits over the inherent dynamic range captured is shown.
Keywords :
CMOS image sensors; VLSI; circuit feedback; parallel architectures; 0.5 micron; 3.7 mW; 5 V; 64 pixel; CMOS active pixel sensor; CMOS n-well process; MOSIS; VLSI; column parallel architecture; in-pixel autoexposure CMOS APS; integration time; real-time feedback; wide dynamic-range linear output; CMOS image sensors; CMOS technology; Dynamic range; Feedback; Layout; Lighting; Pixel; Sensor phenomena and characterization; Spatial resolution; Very large scale integration;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.2003.811984
Filename :
1214739
Link To Document :
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