DocumentCode :
749072
Title :
Anomalous temperature-dependent characteristics of silicon diffused resistors
Author :
Chuang, Hung-Ming ; Tsai, Sheng-Fu ; Thei, Kong-Beng ; Liu, Wen-Chau
Author_Institution :
Dept. of Electr. Eng., Nat. Cheng-Kung Univ., Tainan, Taiwan
Volume :
39
Issue :
13
fYear :
2003
fDate :
6/26/2003 12:00:00 AM
Firstpage :
1015
Lastpage :
1016
Abstract :
The temperature-dependent characteristics of silicon diffused resistors are demonstrated and studied. Based on the presence of a silicide/silicon junction, the device size plays an important role on diffused resistor behaviours. From experimental and theoretical analysis, some important parameters, e.g. the interface resistance (Rinterface), sheet resistance (Rbulk), deviations of resistor length (ΔL) and width (ΔW ) are obtained. Also, anomalous phenomena of temperature coefficient of resistance (TCR) are found.
Keywords :
CMOS integrated circuits; electrostatic discharge; isolation technology; resistors; CMOS; ESD protection circuits; anomalous temperature-dependent characteristics; device size; diffused resistors; interface resistance; resistor length; resistor width; sheet resistance; temperature coefficient of resistance;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20030659
Filename :
1214813
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=749072
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