• DocumentCode
    749612
  • Title

    A complete model of E2PROM memory cells for circuit simulations

  • Author

    Pavan, Paolo ; Larcher, Luca ; Cuozzo, Massimiliano ; Zuliani, Paola ; Conte, Antonino

  • Author_Institution
    Dipt. di Ingegneria dell´´Informazione, Universita di Modena e Reggio Emilia, Italy
  • Volume
    22
  • Issue
    8
  • fYear
    2003
  • Firstpage
    1072
  • Lastpage
    1079
  • Abstract
    E2PROM memory devices are widely used in embedded applications. For an efficient design flow, a correct modeling of these memory cells in every operation condition becomes more and more important, especially due to power consumption limitations. Although E2PROM cells have being used for a long time, very few compact models have been developed. Here, we present a complete compact model based on an original procedure to calculate the floating gate potential in DC conditions, without the need of any capacitive coupling coefficient. This model is designed as a modular structure, so to simplify program/erase and reliability simulations. Program/erase and leakage currents are included by means of simple voltage-controlled current sources implementing their analytical expression. It can be used to simulate memory cells both during read operation (DC conditions) and during program and erase (transient conditions) giving always very accurate results. We show also that, provided there are good descriptions of degradation mechanisms, the same model can be used also for reliability simulations, predicting charge loss due to tunnel oxide degradation.
  • Keywords
    CMOS memory circuits; EPROM; circuit simulation; embedded systems; integrated circuit modelling; integrated circuit reliability; leakage currents; transient analysis; DC conditions; E2PROM memory cells; EEPROM memory devices; VCCS; charge loss; circuit simulations; compact model; computer aided design; degradation mechanisms; embedded applications; floating gate potential; leakage currents; modular structure; power consumption limitations; program/erase simulations; read operation; reliability simulations; semiconductor memories; transient conditions; tunnel oxide degradation; voltage-controlled current sources; Circuit simulation; Computational modeling; Degradation; Integrated circuit modeling; Integrated circuit technology; MOSFETs; Nonvolatile memory; PROM; Predictive models; Voltage;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/TCAD.2003.814952
  • Filename
    1214865