DocumentCode
75028
Title
Electrostatically driven and capacitively detected differential lateral resonant pressure microsensor
Author
Hailong Jiao ; Bo Xie ; Junbo Wang ; Deyong Chen ; Jian Chen
Author_Institution
State Key Lab. of Transducer Technol., Inst. of Electron., Beijing, China
Volume
8
Issue
10
fYear
2013
fDate
Oct. 2013
Firstpage
650
Lastpage
653
Abstract
Presented is the design, fabrication and characterisation of an electrostatic-driving and capacitive-detection differential resonant pressure microsensor. The differential structure consists of two resonators immobilised on the diaphragm. In response to the pressure under measurement, the diaphragm deflection increases the intrinsic resonant frequency of one resonant beam and decreases the resonant frequency of the other. A differential frequency output reduces the common frequency drift caused by stresses and interferences, and thus improves the sensor´s stability. The device geometries were optimised using numerical simulations and the fabrication process was based on a silicon-on-insulator wafer requiring only two masks with simplified microfabrication steps (e.g. sputter, wet etching and deep reactive ion etching). The sensor was quantified in an open-loop characterisation platform, producing a quality factor higher than 10 430 in vacuum ( <; 0.5 Pa). Closed-loop test results recorded a linear resonant frequency shift (a linear correlation of 0.9999) in response to applied pressure, with a sensitivity of 227 Hz/kPa. This resonant pressure microsensor has a simple fabrication process and reliable performance, and can be used for pressure monitoring in various locations including weather stations and aerospace.
Keywords
capacitive sensors; capacitors; diaphragms; elemental semiconductors; microfabrication; microsensors; numerical analysis; pressure measurement; pressure sensors; resonators; silicon; silicon-on-insulator; sputter etching; Si; capacitively detected differential lateral resonant pressure microsensor; closed-loop test; deep reactive ion etching; diaphragm deflection; differential frequency output redution; electrostatically driven differential lateral resonant pressure microsensor; interference; intrinsic resonant frequency; linear resonant frequency shift; microfabrication; numerical simulation; open-loop characterisation platform; pressure measurement; pressure monitoring; quality factor; resonator; sensor stability; silicon-on-insulator wafer; sputter; weather station; wet etching;
fLanguage
English
Journal_Title
Micro & Nano Letters, IET
Publisher
iet
ISSN
1750-0443
Type
jour
DOI
10.1049/mnl.2013.0271
Filename
6651466
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